SiC substrate don murfin fim ɗin CVD

Takaitaccen Bayani:

Tsarin Tsabtace Tururin Sinadarin Sinadarin (CVD) oxide tsari ne na girma mai layi inda iskar gas mai tsari ke saka siririn fim a kan wafer a cikin reactor. Tsarin girma yana da ƙarancin zafin jiki kuma yana da ƙimar girma mafi girma idan aka kwatanta da thermal oxide. Hakanan yana samar da yadudduka masu siririn silicon dioxide saboda ana ajiye fim ɗin, maimakon girma. Wannan tsari yana samar da fim mai juriyar wutar lantarki mai yawa, wanda yake da kyau don amfani a cikin na'urorin IC da MEMS, da sauran...


  • Tashar jiragen ruwa:Weifang ko Qingdao
  • Sabuwar taurin Mohs: 13
  • Babban kayan aiki:Silicon Carbide
  • Cikakken Bayani game da Samfurin

    ZPC - masana'antar yumbu na silicon carbide

    Alamun Samfura

    Tsarin Tururin Sinadarai

    Tacewar tururin sinadarai (CVD) oxide tsari ne na girma mai layi inda iskar gas mai tsari ke saka siririn fim a kan wafer a cikin reactor. Tsarin girma yana da ƙarancin zafi kuma yana da ƙimar girma mafi girma idan aka kwatanta daoxide mai zafiYana kuma samar da yadudduka masu siririn silicon dioxide saboda fim ɗin yana da ƙarfi, maimakon girma. Wannan tsari yana samar da fim mai juriyar wutar lantarki mai ƙarfi, wanda yake da kyau don amfani a cikin na'urorin IC da MEMS, da sauran aikace-aikace da yawa.

    Ana yin sinadarin oxide na tururin sinadarai (CVD) lokacin da ake buƙatar wani Layer na waje amma ba za a iya haɗa sinadarin silicon ba.

    Girman Tsabtace Tururin Sinadarai:

    Girman CVD yana faruwa ne lokacin da aka shigar da iskar gas ko tururi (precursor) a cikin wani reactor mai ƙarancin zafi inda aka shirya wafers ko dai a tsaye ko a kwance. Iskar tana motsawa ta cikin tsarin kuma tana bazuwa daidai gwargwado a saman wafers ɗin. Yayin da waɗannan abubuwan da suka riga suka fara motsawa ta cikin reactor ɗin, wafers ɗin suna fara shaye su a saman su.

    Da zarar abubuwan da suka riga suka fara yaɗuwa daidai gwargwado a cikin tsarin, halayen sinadarai suna farawa a saman abubuwan da ke ƙarƙashin ƙasa. Waɗannan halayen sinadarai suna farawa ne a matsayin tsibirai, kuma yayin da tsarin ke ci gaba, tsibiran suna girma kuma suna haɗuwa don ƙirƙirar fim ɗin da ake so. Halayen sinadarai suna ƙirƙirar samfuran bipolar a saman wafers, waɗanda ke yaɗuwa a kan iyakar layin kuma suna gudana daga cikin reactor, suna barin wafers kawai tare da murfin fim ɗin da aka ajiye.

    Siffa ta 1

    Tsarin tattara tururin sinadarai

     

    (1.) Iskar Gas/Turi ya fara amsawa kuma ya samar da tsibirai a saman ƙasa. (2.) Tsibirai suna girma kuma suna fara haɗuwa tare. (3.) An ƙirƙiri fim mai ci gaba da tsari iri ɗaya.
     

    Fa'idodin Zubar da Tururin Sinadarai:

    • Tsarin girma mai ƙarancin zafin jiki.
    • Saurin saka kuɗi (musamman APCVD).
    • Bai kamata ya zama wani abu mai kama da silicon ba.
    • Kyakkyawan ɗaukar hoto (musamman PECVD).
    Hoto na 2
    CVD vs. thermal oxideTara silicon dioxide vs girma

     


    Don ƙarin bayani game da adana tururin sinadarai ko don neman ƙiyasin farashi, don AllahTUNTUBA SVMyau don yin magana da memba na ƙungiyar tallace-tallace tamu.


    Nau'ikan CVD

    LPCVD

    Tsarin adana tururin sinadarai mai ƙarancin matsin lamba tsari ne na adana tururin sinadarai ba tare da matsi ba. Babban bambanci tsakanin LPCVD da sauran hanyoyin CVD shine zafin ajiya. LPCVD yana amfani da mafi girman zafin jiki don adana fina-finai, yawanci sama da 600°C.

    Yanayin ƙasa mai matsin lamba yana ƙirƙirar fim mai daidaito sosai tare da tsarki mai yawa, sake haifuwa, da kuma daidaito. Ana yin wannan tsakanin Pa 10 - 1,000, yayin da matsin lamba na ɗaki na yau da kullun shine Pa 101,325. Zafin jiki yana ƙayyade kauri da tsarkin waɗannan fina-finan, tare da yanayin zafi mai yawa wanda ke haifar da fina-finai masu kauri da tsabta.

    • Fina-finan da aka fi sakawa:polysilicon, oxides da aka sha da kuma waɗanda ba a sha ba,nitrides.

     

    PECVD

    Tsarin adana tururin sinadarai mai ƙarfi na plasma wata dabara ce ta adana tururin sinadarai mai ƙarancin zafi da yawan fim. PECVD yana faruwa ne a cikin na'urar CVD tare da ƙara plasma, wanda iskar gas ce mai ionized tare da babban abun ciki na electron kyauta (~50%). Wannan hanya ce ta adana zafi mai ƙarancin zafi wadda ke faruwa tsakanin 100°C – 400°C. Ana iya yin PECVD a ƙananan yanayin zafi saboda kuzarin da ke fitowa daga electrons kyauta yana raba iskar gas mai amsawa don samar da fim a saman wafer.

    Wannan hanyar zubar jini tana amfani da nau'ikan plasma guda biyu daban-daban:

    1. Sanyi (wanda ba shi da zafi): electrons suna da zafin jiki mafi girma fiye da barbashi masu tsaka-tsaki da ions. Wannan hanyar tana amfani da kuzarin electrons ta hanyar canza matsin lamba a cikin ɗakin ajiyar kaya.
    2. Zafin Jiki: electrons suna da zafin jiki iri ɗaya da barbashi da ions a cikin ɗakin ajiyar bayanai.

    A cikin ɗakin ajiyar bayanai, ana aika ƙarfin lantarki na mitar rediyo tsakanin electrodes sama da ƙasa da wafer ɗin. Wannan yana cajin electrons kuma yana kiyaye su cikin yanayi mai daɗi don saka fim ɗin da ake so.

    Akwai matakai guda huɗu don haɓaka fina-finai ta hanyar PECVD:

    1. Sanya wafer da aka yi niyya a kan wani lantarki a cikin ɗakin ajiyar kaya.
    2. Gabatar da iskar gas mai amsawa da abubuwan da ke ɓoyewa zuwa ɗakin.
    3. A aika plasma tsakanin electrodes sannan a shafa wutar lantarki don motsa plasma.
    4. Iskar gas mai amsawa tana rabuwa kuma tana amsawa da saman wafer don samar da siririn fim, samfuran da suka biyo baya suna yaɗuwa daga ɗakin.

     

    APCVD

    Tacewar tururin sinadarai mai matsin lamba a yanayi wata dabara ce ta adana zafi mai ƙarancin zafi da ke faruwa a cikin tanderu a matsin yanayi na yau da kullun. Kamar sauran hanyoyin CVD, APCVD yana buƙatar iskar gas mai farawa a cikin ɗakin ajiyar kaya, sannan zafin jiki yana ƙaruwa a hankali don haɓaka halayen akan saman wafer da kuma sanya siririn fim. Saboda sauƙin wannan hanyar, tana da yawan ajiyar kaya mai yawa.

    • Filayen da aka saba ajiyewa: silicon oxides da aka yi amfani da su da kuma wadanda ba a yi amfani da su ba, silicon nitrides. Haka kuma ana amfani da su a cikinrage zafi.

    HDP CVD

    Tacewar tururin sinadarai mai yawan yawa a cikin jini sigar PECVD ce da ke amfani da babban sinadarin plasma mai yawa, wanda ke ba wafers damar yin aiki da ƙaramin zafin jiki (tsakanin 80°C-150°C) a cikin ɗakin ajiyar kaya. Wannan kuma yana ƙirƙirar fim mai ƙarfin cika rami.


    SACVD

    Tacewar tururin sinadarai na matsin lamba a ƙarƙashin yanayi ya bambanta da sauran hanyoyi saboda yana faruwa ƙasa da matsin lamba na ɗaki na yau da kullun kuma yana amfani da ozone (O2)3) don taimakawa wajen haɓaka amsawar. Tsarin sakawa yana faruwa ne a matsin lamba mafi girma fiye da LPCVD amma ƙasa da APCVD, tsakanin kusan Pa 13,300 da Pa 80,000. Fina-finan SACVD suna da babban ƙimar sakawa kuma wanda ke inganta yayin da zafin jiki ke ƙaruwa har zuwa kusan 490°C, a lokacin ne yake fara raguwa.

    • Fina-finan da aka fi sakawa:BPSG, PSG,TEOS.

  • Na baya:
  • Na gaba:

  • Kamfanin Shandong Zhongpeng Special Ceramics Co., Ltd yana ɗaya daga cikin manyan hanyoyin samar da sabbin kayan yumbu na silicon carbide a China. SiC technical yumbu: Taurin Moh shine 9 (taurin New Moh shine 13), tare da kyakkyawan juriya ga zaizayar ƙasa da tsatsa, kyakkyawan juriya - juriya da hana iskar shaka. Rayuwar sabis na samfurin SiC shine sau 4 zuwa 5 fiye da kayan alumina 92%. MOR na RBSiC shine sau 5 zuwa 7 na SNBSC, ana iya amfani da shi don siffofi masu rikitarwa. Tsarin ƙididdigewa yana da sauri, isarwa kamar yadda aka yi alkawari kuma ingancin ba shi da nasaba da komai. Kullum muna ci gaba da ƙalubalantar manufofinmu kuma muna mayar da zukatanmu ga al'umma.

     

    1 SiC ceramic factory 工厂

    Kayayyaki Masu Alaƙa

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